Chang-Ki Baek*, Sooyoung Park, Myung-Dong Ko, Taiuk Rim, Seongwook Choi,and Yoon-Ha Jeong, "Characteristics of Gate-all-Around Silicon Nanowire Field Effect Transistors with Asymmetric Channel Width and Source/Drain Doping Concentration," Journal of Applied Physics, vol. 112, Issue 3, pp. 034513 Aug. 2012
http://scitation.aip.org/content/aip/journal/jap/112/3/10.1063/1.4745858